Trimethylaluminum (TMA)
危险产品
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价格标语
Overview
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
CAS号
75-24-1
分子式
Al2(CH3)6
产品等级
Electronic Grade
危险等级
CLASS 3
Flammable Liquids
Appearance
liquid
包装形式
Canister Drum
产品描述
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.