Trimethylaluminum (TMA)
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Overview
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
CAS Number
75-24-1
Molecular Formula
Al2(CH3)6
Product Grade
Electronic Grade
Danger Class
CLASS 3
Flammable Liquids
Appearance
liquid
Delivery Forms
Canister Drum
Product Description
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.
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