Trimetilaluminio (TMA)
Precio a Consultar
Precio a Consultar
Resumen
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
Descripción del Producto
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.