Trimethylaluminum (TMA)
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Resumen
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
Número CAS
75-24-1
Fórmula Molecular
Al2(CH3)6
Product Grade
Electronic Grade
Danger Class
CLASS 3
Flammable Liquids
Apariencia
liquid
Formas de entrega
Canister Drum
Descripción del Producto
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.
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