Triméthylaluminium (TMA)
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Prix sur Demande
Aperçu
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
Description du Produit
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.