Trimethylaluminum (TMA)
المنتج الخطر
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شعار السعر
Overview
Trimethylaluminum (TMA) for high-k dielectric films in semiconductor manufacturing.
رقم CAS
75-24-1
الصيغة الجزيئية
Al2(CH3)6
درجة المنتج
Electronic Grade
فئة الخطر
CLASS 3
Flammable Liquids
Appearance
liquid
أشكال التسليم
Canister Drum
وصف المنتج
Trimethylaluminum (TMA) is a key precursor used in atomic layer deposition (ALD) processes. It is widely utilized in the electronics and semiconductor industry for the formation of high-k dielectric films. TMA offers excellent thermal stability and reactivity, making it suitable for precise and uniform film deposition.
المنتجات ذات الصلة
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