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干法刻蚀气体（CF₄、C₄F₈、SF₆、NF₃）
CAS: 75-71-8, 115-20-8, 2551-62-4, 7783-54-2 CF₄, C₄F₈, SF₆, NF₃
电子和半导体化学品 Plasma Gases
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查看详情 沉积气体（SiH₄、TEOS、WF₆）
CAS: 7803-62-5, 78-10-4, 7783-82-6 SiH₄, C₈H₂₀O₄Si, WF₆
电子和半导体化学品 CVD/ALD Gases
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