I-Line光刻胶 (365 nm)

I-Line Photoresist (365 nm) is a specialized chemical used in the photolithography process of semiconductor and integrated circuit (IC) manufacturing. It is designed to be sensitive to 365 nm wavelength light, allowing for precise pattern formation on silicon wafers. This product is crucial in the electronics industry, particularly in IC manufacturing, where it supports the creation of fine patterns with excellent resolution and adhesion properties. Its key features include high sensitivity, good etch resistance, and stability under processing conditions.