KrF光刻胶 (248 nm)

KrF Photoresist (248 nm) is a specialized chemical used in the semiconductor industry for creating fine patterns on silicon wafers. It is widely applied in IC manufacturing processes, where its high sensitivity and resolution at 248 nm wavelength enable the production of advanced microelectronic devices. This photoresist offers excellent adhesion to substrates, good etch resistance, and consistent performance, making it an essential material in the fabrication of integrated circuits.