EUV光刻胶 (13.5 nm)

EUV Photoresist (13.5 nm) is a high-precision material designed for extreme ultraviolet lithography in semiconductor fabrication. It enables the creation of finer and more complex circuit patterns on silicon wafers. This product is crucial for R&D and high-volume manufacturing (HVM) in the electronics and semiconductors industry, offering excellent resolution, sensitivity, and etch resistance.