EUV Photoresist (13.5 nm)
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Resumen
EUV Photoresist (13.5 nm) for advanced semiconductor manufacturing.
Número CAS
N/A
Fórmula Molecular
N/A
Product Grade
SEMI
Apariencia
liquid
Formas de entrega
Canister Drum
Descripción del Producto
EUV Photoresist (13.5 nm) is a high-precision material designed for extreme ultraviolet lithography in semiconductor fabrication. It enables the creation of finer and more complex circuit patterns on silicon wafers. This product is crucial for R&D and high-volume manufacturing (HVM) in the electronics and semiconductors industry, offering excellent resolution, sensitivity, and etch resistance.
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