EUV Photoresist (13.5 nm)
Contact for Price
Price on request
Aperçu
EUV Photoresist (13.5 nm) for advanced semiconductor manufacturing.
Numéro CAS
N/A
Formule Moléculaire
N/A
Product Grade
SEMI
Apparence
liquid
Formes de livraison
Canister Drum
Description du Produit
EUV Photoresist (13.5 nm) is a high-precision material designed for extreme ultraviolet lithography in semiconductor fabrication. It enables the creation of finer and more complex circuit patterns on silicon wafers. This product is crucial for R&D and high-volume manufacturing (HVM) in the electronics and semiconductors industry, offering excellent resolution, sensitivity, and etch resistance.
Produits Connexes
More products from Photoresists in Electronic & Semiconductor Chemicals