EUV Photoresist (13.5 nm)
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Overview
EUV Photoresist (13.5 nm) for advanced semiconductor manufacturing.
CAS-Nummer
N/A
Molekularformel
N/A
Product Grade
SEMI
Appearance
liquid
Lieferformen
Canister Drum
Product Description
EUV Photoresist (13.5 nm) is a high-precision material designed for extreme ultraviolet lithography in semiconductor fabrication. It enables the creation of finer and more complex circuit patterns on silicon wafers. This product is crucial for R&D and high-volume manufacturing (HVM) in the electronics and semiconductors industry, offering excellent resolution, sensitivity, and etch resistance.
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