沉积气体 (SiH₄, TEOS, WF₆)

Deposition Gases (SiH₄, TEOS, WF₆) are essential in the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These gases are used to form high-quality thin films in the electronics and semiconductor industry. They play a critical role in creating dielectric layers, silicon-based materials, and tungsten films, contributing to the performance and reliability of electronic devices.