Deposition Gases (SiH₄, TEOS, WF₆)
Produit Dangereux
Contact for Price
Price on request
Aperçu
Deposition Gases (SiH₄, TEOS, WF₆) for semiconductor thin film applications.
Numéro CAS
7803-62-5, 78-10-4, 7783-82-6
Formule Moléculaire
SiH₄, C₈H₂₀O₄Si, WF₆
Product Grade
Electronic Grade
Danger Class
CLASS 2
Gases
Apparence
gas
Formes de livraison
Canister
Description du Produit
Deposition Gases (SiH₄, TEOS, WF₆) are essential in the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These gases are used to form high-quality thin films in the electronics and semiconductor industry. They play a critical role in creating dielectric layers, silicon-based materials, and tungsten films, contributing to the performance and reliability of electronic devices.
Produits Connexes
More products from CVD/ALD Gases in Electronic & Semiconductor Chemicals