Deposition Gases (SiH₄, TEOS, WF₆)
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Overview
Deposition Gases (SiH₄, TEOS, WF₆) for semiconductor thin film applications.
CAS-Nummer
7803-62-5, 78-10-4, 7783-82-6
Molekularformel
SiH₄, C₈H₂₀O₄Si, WF₆
Product Grade
Electronic Grade
Danger Class
CLASS 2
Gases
Appearance
gas
Lieferformen
Canister
Product Description
Deposition Gases (SiH₄, TEOS, WF₆) are essential in the chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. These gases are used to form high-quality thin films in the electronics and semiconductor industry. They play a critical role in creating dielectric layers, silicon-based materials, and tungsten films, contributing to the performance and reliability of electronic devices.
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