Résine photosensible G-Line (365 nm)

G-Line Photoresist (365 nm) is a high-precision photoresist designed for use in the semiconductor industry. It is specifically tailored for integrated circuit (IC) manufacturing, where it plays a crucial role in the photolithography process. This product offers excellent adhesion, resolution, and sensitivity to 365 nm light, making it ideal for creating fine patterns on silicon wafers. Its properties as a curing agent and UV absorber ensure reliable performance under various processing conditions.