干法刻蚀气体 (CF₄, C₄F₈, SF₆, NF₃)

Dry Etch Gases, including CF₄, C₄F₈, SF₆, and NF₃, are high-purity gases used in the semiconductor industry. These gases play a critical role in plasma etching processes, enabling the creation of fine patterns on silicon wafers. They are essential for achieving high-precision etching with minimal substrate damage, making them indispensable in the manufacturing of advanced electronic devices.