Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃)
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Overview
Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃) for precise semiconductor etching.
CAS Number
75-71-8, 115-20-8, 2551-62-4, 7783-54-2
Molecular Formula
CF₄, C₄F₈, SF₆, NF₃
Product Grade
Electronic Grade
Danger Class
CLASS 2
Gases
Appearance
gas
Delivery Forms
Canister
Product Description
Dry Etch Gases, including CF₄, C₄F₈, SF₆, and NF₃, are high-purity gases used in the semiconductor industry. These gases play a critical role in plasma etching processes, enabling the creation of fine patterns on silicon wafers. They are essential for achieving high-precision etching with minimal substrate damage, making them indispensable in the manufacturing of advanced electronic devices.
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