Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃)
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Resumen
Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃) for precise semiconductor etching.
Número CAS
75-71-8, 115-20-8, 2551-62-4, 7783-54-2
Fórmula Molecular
CF₄, C₄F₈, SF₆, NF₃
Product Grade
Electronic Grade
Danger Class
CLASS 2
Gases
Apariencia
gas
Formas de entrega
Canister
Descripción del Producto
Dry Etch Gases, including CF₄, C₄F₈, SF₆, and NF₃, are high-purity gases used in the semiconductor industry. These gases play a critical role in plasma etching processes, enabling the creation of fine patterns on silicon wafers. They are essential for achieving high-precision etching with minimal substrate damage, making them indispensable in the manufacturing of advanced electronic devices.
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