SC2 Clean (HCl + H₂O₂ + H₂O)

SC2 Clean (HCl + H₂O₂ + H₂O) - CAS N/A - Chemical Product
危险产品
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价格标语

Overview

SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.

CAS号

N/A

分子式

HCl + H₂O₂ + H₂O

产品等级

SEMI

危险等级

CLASS 8

Corrosive Substances

Appearance

liquid

包装形式

Drum IBC Bulk

产品描述

SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.