SC2 Clean (HCl + H₂O₂ + H₂O)

SC2 Clean (HCl + H₂O₂ + H₂O) - CAS N/A - Chemical Product
Hazardous Product
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Overview

SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.

CAS Number

N/A

Molecular Formula

HCl + H₂O₂ + H₂O

Product Grade

SEMI

Danger Class

CLASS 8

Corrosive Substances

Appearance

liquid

Delivery Forms

Drum IBC Bulk

Product Description

SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.