SC2 Clean (HCl + H₂O₂ + H₂O)
Produit Dangereux
Contact for Price
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Aperçu
SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.
Numéro CAS
N/A
Formule Moléculaire
HCl + H₂O₂ + H₂O
Product Grade
SEMI
Danger Class
CLASS 8
Corrosive Substances
Apparence
liquid
Formes de livraison
Drum IBC Bulk
Description du Produit
SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.
Produits Connexes
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