SC2 Clean (HCl + H₂O₂ + H₂O)
Producto Peligroso
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Price on request
Resumen
SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.
Número CAS
N/A
Fórmula Molecular
HCl + H₂O₂ + H₂O
Product Grade
SEMI
Danger Class
CLASS 8
Corrosive Substances
Apariencia
liquid
Formas de entrega
Drum IBC Bulk
Descripción del Producto
SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.
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