SC2 Clean (HCl + H₂O₂ + H₂O)
المنتج الخطر
Contact for Price
شعار السعر
Overview
SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.
رقم CAS
N/A
الصيغة الجزيئية
HCl + H₂O₂ + H₂O
درجة المنتج
SEMI
فئة الخطر
CLASS 8
Corrosive Substances
Appearance
liquid
أشكال التسليم
Drum IBC Bulk
وصف المنتج
SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.
المنتجات ذات الصلة
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