SC2 Clean (HCl + H₂O₂ + H₂O)

SC2 Clean (HCl + H₂O₂ + H₂O) - CAS N/A - Chemical Product
المنتج الخطر
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شعار السعر

Overview

SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.

رقم CAS

N/A

الصيغة الجزيئية

HCl + H₂O₂ + H₂O

درجة المنتج

SEMI

فئة الخطر

CLASS 8

Corrosive Substances

Appearance

liquid

أشكال التسليم

Drum IBC Bulk

وصف المنتج

SC2 Clean is a specialized cleaning solution designed for the electronics and semiconductor industry. It effectively removes metal contaminants from silicon wafers, ensuring high purity and performance in semiconductor manufacturing. This product is widely used in the fabrication of integrated circuits and microelectronic devices, where its strong etching and cleaning properties are crucial.