SC1 Clean (NH₄OH + H₂O₂ + H₂O)
危险产品
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价格标语
Overview
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a powerful cleaning solution for semiconductor wafers.
CAS号
N/A
分子式
NH₄OH + H₂O₂ + H₂O
产品等级
SEMI
危险等级
CLASS 8
Corrosive Substances
Appearance
liquid
包装形式
Drum IBC Bulk
产品描述
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a high-purity cleaning solution designed for the electronics and semiconductor industry. It effectively removes particles and contaminants from silicon wafers, ensuring optimal performance and yield in semiconductor manufacturing. This solution is widely used in wafer cleaning processes due to its excellent etching and particle removal capabilities. Key properties include high purity, stability, and compatibility with various semiconductor materials.
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