SC1 Clean (NH₄OH + H₂O₂ + H₂O)
Producto Peligroso
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Resumen
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a powerful cleaning solution for semiconductor wafers.
Número CAS
N/A
Fórmula Molecular
NH₄OH + H₂O₂ + H₂O
Product Grade
SEMI
Danger Class
CLASS 8
Corrosive Substances
Apariencia
liquid
Formas de entrega
Drum IBC Bulk
Descripción del Producto
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a high-purity cleaning solution designed for the electronics and semiconductor industry. It effectively removes particles and contaminants from silicon wafers, ensuring optimal performance and yield in semiconductor manufacturing. This solution is widely used in wafer cleaning processes due to its excellent etching and particle removal capabilities. Key properties include high purity, stability, and compatibility with various semiconductor materials.
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