SC1 Clean (NH₄OH + H₂O₂ + H₂O)
المنتج الخطر
Contact for Price
شعار السعر
Overview
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a powerful cleaning solution for semiconductor wafers.
رقم CAS
N/A
الصيغة الجزيئية
NH₄OH + H₂O₂ + H₂O
درجة المنتج
SEMI
فئة الخطر
CLASS 8
Corrosive Substances
Appearance
liquid
أشكال التسليم
Drum IBC Bulk
وصف المنتج
SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a high-purity cleaning solution designed for the electronics and semiconductor industry. It effectively removes particles and contaminants from silicon wafers, ensuring optimal performance and yield in semiconductor manufacturing. This solution is widely used in wafer cleaning processes due to its excellent etching and particle removal capabilities. Key properties include high purity, stability, and compatibility with various semiconductor materials.
المنتجات ذات الصلة
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