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Acetone Ethanol Benzene Methanol Toluene Acetic Acid

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Acetone Ethanol Benzene Methanol Toluene Acetic Acid

Electronic-Grade Sulfuric Acid (98%, G5) - CAS 7664-93-9 - Chemical Product

CAS: 7664-93-9 H2SO4

Electronic-Grade Sulfuric Acid (98%, G5)

Electronic & Semiconductor Chemicals Electronic Acids

Electronic-Grade Sulfuric Acid (98%, G5) for semiconductor processing.

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Electronic-Grade Nitric Acid (68%, G4/G5) - CAS 7697-37-2 - Chemical Product

CAS: 7697-37-2 HNO3

Electronic-Grade Nitric Acid (68%, G4/G5)

Electronic & Semiconductor Chemicals Electronic Acids

Electronic-Grade Nitric Acid (68%, G4/G5) for semiconductor processing.

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Electronic-Grade Hydrochloric Acid (31%) - CAS 7647-01-0 - Chemical Product

CAS: 7647-01-0 HCl

Electronic-Grade Hydrochloric Acid (31%)

Electronic & Semiconductor Chemicals Electronic Acids

Electronic-Grade Hydrochloric Acid (31%) for semiconductor processing.

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Electronic-Grade Phosphoric Acid (85%) - CAS 7664-38-2 - Chemical Product

CAS: 7664-38-2 H3PO4

Electronic-Grade Phosphoric Acid (85%)

Electronic & Semiconductor Chemicals Electronic Acids

Electronic-Grade Phosphoric Acid (85%) for semiconductor processing.

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Electronic-Grade Hydrofluoric Acid (HF, 49%) - CAS 7664-39-3 - Chemical Product

CAS: 7664-39-3 HF

Electronic-Grade Hydrofluoric Acid (HF, 49%)

Electronic & Semiconductor Chemicals Electronic Acids

Electronic-Grade Hydrofluoric Acid (HF, 49%) for semiconductor etching.

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Electronic-Grade Acetic Acid (99.9%+) - CAS 64-19-7 - Chemical Product

CAS: 64-19-7 CH3COOH

Electronic-Grade Acetic Acid (99.9%+)

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade Acetic Acid (99.9%+) for high-purity semiconductor applications.

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Electronic-Grade Isopropyl Alcohol (IPA, 99.99%) - CAS 67-63-0 - Chemical Product

CAS: 67-63-0 C3H8O

Electronic-Grade Isopropyl Alcohol (IPA, 99.99%)

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade Isopropyl Alcohol (IPA, 99.99%) for high-purity cleaning.

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Electronic-Grade Acetone (99.99%+) - CAS 67-64-1 - Chemical Product

CAS: 67-64-1 C3H6O

Electronic-Grade Acetone (99.99%+)

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade Acetone (99.99%+) for high-purity semiconductor applications.

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Electronic-Grade N-Methyl-2-pyrrolidone (NMP) - CAS 872-50-4 - Chemical Product

CAS: 872-50-4 C5H9NO

Electronic-Grade N-Methyl-2-pyrrolidone (NMP)

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade N-Methyl-2-pyrrolidone (NMP) for high purity applications.

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Electronic-Grade Methanol - CAS 67-56-1 - Chemical Product

CAS: 67-56-1 CH₃OH

Electronic-Grade Methanol

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade Methanol for high-purity semiconductor and electronics cleaning.

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Electronic-Grade Ethanol - CAS 64-17-5 - Chemical Product

CAS: 64-17-5 C2H5OH

Electronic-Grade Ethanol

Electronic & Semiconductor Chemicals Electronic Solvents

Electronic-Grade Ethanol for high purity cleaning in electronics.

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Ultra-Pure Water (UPW) - CAS 7732-18-5 - Chemical Product

CAS: 7732-18-5 H2O

Ultra-Pure Water (UPW)

Electronic & Semiconductor Chemicals Ultrapure Fluids

Ultra-Pure Water (UPW) for semiconductor wafer rinse.

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G-Line Photoresist (365 nm) - CAS N/A - Chemical Product

CAS: N/A N/A

G-Line Photoresist (365 nm)

Electronic & Semiconductor Chemicals Photoresists

G-Line Photoresist (365 nm) for precise IC manufacturing.

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I-Line Photoresist (365 nm) - CAS N/A - Chemical Product

CAS: N/A N/A

I-Line Photoresist (365 nm)

Electronic & Semiconductor Chemicals Photoresists

I-Line Photoresist (365 nm) for high-precision IC manufacturing.

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KrF Photoresist (248 nm) - CAS N/A - Chemical Product

CAS: N/A N/A

KrF Photoresist (248 nm)

Electronic & Semiconductor Chemicals Photoresists

KrF Photoresist (248 nm) for high-precision IC manufacturing.

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ArF Photoresist (193 nm, dry) - CAS N/A - Chemical Product

CAS: N/A N/A

ArF Photoresist (193 nm, dry)

Electronic & Semiconductor Chemicals Photoresists

ArF Photoresist (193 nm, dry) for high-precision IC manufacturing.

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ArF Immersion Photoresist (193 nm) - CAS N/A - Chemical Product

CAS: N/A N/A

ArF Immersion Photoresist (193 nm)

Electronic & Semiconductor Chemicals Photoresists

ArF Immersion Photoresist (193 nm) for advanced semiconductor manufacturing.

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EUV Photoresist (13.5 nm) - CAS N/A - Chemical Product

CAS: N/A N/A

EUV Photoresist (13.5 nm)

Electronic & Semiconductor Chemicals Photoresists

EUV Photoresist (13.5 nm) for advanced semiconductor manufacturing.

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Positive Tone Photoresist - CAS N/A - Chemical Product

CAS: N/A N/A

Positive Tone Photoresist

Electronic & Semiconductor Chemicals Photoresists

Positive Tone Photoresist for high-precision IC manufacturing.

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Negative Tone Photoresist - CAS N/A - Chemical Product

CAS: N/A N/A

Negative Tone Photoresist

Electronic & Semiconductor Chemicals Photoresists

Negative Tone Photoresist for precise IC manufacturing.

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Bottom Anti-Reflective Coating (BARC) - CAS N/A - Chemical Product

CAS: N/A N/A

Bottom Anti-Reflective Coating (BARC)

Electronic & Semiconductor Chemicals Photoresist Ancillaries

Bottom Anti-Reflective Coating (BARC) for enhanced lithography performance.

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Top Coat (Immersion Lithography) - CAS N/A - Chemical Product

CAS: N/A N/A

Top Coat (Immersion Lithography)

Electronic & Semiconductor Chemicals Photoresist Ancillaries

Top Coat (Immersion Lithography) for advanced semiconductor manufacturing.

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Photoacid Generator (PAG) - CAS N/A - Chemical Product

CAS: N/A N/A

Photoacid Generator (PAG)

Electronic & Semiconductor Chemicals Photoresist Ancillaries

Photoacid Generator (PAG) for advanced lithography processes.

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TMAH-Based Developer (2.38%) - CAS 75-59-2 - Chemical Product

CAS: 75-59-2 N/A

TMAH-Based Developer (2.38%)

Electronic & Semiconductor Chemicals Developers

TMAH-Based Developer (2.38%) for high-precision lithography in semiconductor manufacturing.

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Buffered Oxide Etch (BOE, HF/NH₄F) - CAS N/A - Chemical Product

CAS: N/A HF/NH₄F

Buffered Oxide Etch (BOE, HF/NH₄F)

Electronic & Semiconductor Chemicals Wet Etchants

Buffered Oxide Etch (BOE, HF/NH₄F) for precise oxide layer removal.

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SC1 Clean (NH₄OH + H₂O₂ + H₂O) - CAS N/A - Chemical Product

CAS: N/A NH₄OH + H₂O₂ + H₂O

SC1 Clean (NH₄OH + H₂O₂ + H₂O)

Electronic & Semiconductor Chemicals Cleaning Solutions

SC1 Clean (NH₄OH + H₂O₂ + H₂O) is a powerful cleaning solution for semiconductor wafers.

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SC2 Clean (HCl + H₂O₂ + H₂O) - CAS N/A - Chemical Product

CAS: N/A HCl + H₂O₂ + H₂O

SC2 Clean (HCl + H₂O₂ + H₂O)

Electronic & Semiconductor Chemicals Cleaning Solutions

SC2 Clean (HCl + H₂O₂ + H₂O) for semiconductor wafer cleaning.

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RCA Standard Clean - CAS N/A - Chemical Product

CAS: N/A N/A

RCA Standard Clean

Electronic & Semiconductor Chemicals Cleaning Solutions

RCA Standard Clean for effective wafer cleaning in semiconductor processes.

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Copper Barrier Cleaners - CAS N/A - Chemical Product

CAS: N/A N/A

Copper Barrier Cleaners

Electronic & Semiconductor Chemicals Cleaning Solutions

Copper Barrier Cleaners for effective semiconductor processing.

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Post-CMP Cleaning Fluids - CAS N/A - Chemical Product

CAS: N/A N/A

Post-CMP Cleaning Fluids

Electronic & Semiconductor Chemicals Cleaning Solutions

Post-CMP Cleaning Fluids for semiconductor planarization processes.

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Single-Wafer Spray Cleaners - CAS N/A - Chemical Product

CAS: N/A N/A

Single-Wafer Spray Cleaners

Electronic & Semiconductor Chemicals Cleaning Solutions

Single-Wafer Spray Cleaners for advanced semiconductor nodes.

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Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃) - CAS 75-71-8, 115-20-8, 2551-62-4, 7783-54-2 - Chemical Product

CAS: 75-71-8, 115-20-8, 2551-62-4, 7783-54-2 CF₄, C₄F₈, SF₆, NF₃

Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃)

Electronic & Semiconductor Chemicals Plasma Gases

Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃) for precise semiconductor etching.

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Deposition Gases (SiH₄, TEOS, WF₆) - CAS 7803-62-5, 78-10-4, 7783-82-6 - Chemical Product

CAS: 7803-62-5, 78-10-4, 7783-82-6 SiH₄, C₈H₂₀O₄Si, WF₆

Deposition Gases (SiH₄, TEOS, WF₆)

Electronic & Semiconductor Chemicals CVD/ALD Gases

Deposition Gases (SiH₄, TEOS, WF₆) for semiconductor thin film applications.

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Tungsten Hexafluoride (WF₆) - CAS 7783-82-6 - Chemical Product

CAS: 7783-82-6 WF₆

Tungsten Hexafluoride (WF₆)

Electronic & Semiconductor Chemicals CVD Gases

Tungsten Hexafluoride (WF₆) for semiconductor processing.

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Silane (SiH₄) - CAS 7803-62-5 - Chemical Product

CAS: 7803-62-5 SiH₄

Silane (SiH₄)

Electronic & Semiconductor Chemicals CVD Gases

Silane (SiH₄) for high-purity semiconductor applications.

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TEOS (Tetraethyl Orthosilicate) - CAS 1978/10/4 - Chemical Product

CAS: 1978/10/4 C8H20O4Si

TEOS (Tetraethyl Orthosilicate)

Electronic & Semiconductor Chemicals CVD Precursors

TEOS for high-quality dielectric films in electronics.

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Titanium Tetrachloride (TiCl₄) - CAS 7719/12/2 - Chemical Product

CAS: 7719/12/2 TiCl₄

Titanium Tetrachloride (TiCl₄)

Electronic & Semiconductor Chemicals CVD Precursors

Titanium Tetrachloride (TiCl₄) for high-purity CVD applications in electronics.

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Tantalum Pentachloride (TaCl₅) - CAS 7721/2/6 - Chemical Product

CAS: 7721/2/6 TaCl₅

Tantalum Pentachloride (TaCl₅)

Electronic & Semiconductor Chemicals CVD Precursors

Tantalum Pentachloride (TaCl₅) for high-performance electronic applications.

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Ammonium Hydroxide (28–30%, Electronic Grade) - CAS 1336-21-6 - Chemical Product

CAS: 1336-21-6 NH4OH

Ammonium Hydroxide (28–30%, Electronic Grade)

Electronic & Semiconductor Chemicals Bases

Ammonium Hydroxide (28–30%, Electronic Grade) for semiconductor cleaning.

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Hydrogen Peroxide (30%, Electronic Grade) - CAS 7722-84-1 - Chemical Product

CAS: 7722-84-1 H2O2

Hydrogen Peroxide (30%, Electronic Grade)

Electronic & Semiconductor Chemicals Oxidizers

Hydrogen Peroxide (30%, Electronic Grade) for high-purity semiconductor processing.

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Silicon Wafers (polished) - CAS 7782-42-5 - Chemical Product

CAS: 7782-42-5 Si

Silicon Wafers (polished)

Electronic & Semiconductor Chemicals Substrates

Silicon Wafers (polished) for high-precision IC manufacturing.

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Gallium Arsenide (GaAs) Substrates - CAS 1303-00-0 - Chemical Product

CAS: 1303-00-0 GaAs

Gallium Arsenide (GaAs) Substrates

Electronic & Semiconductor Chemicals Substrates

Gallium Arsenide (GaAs) Substrates for high-performance optoelectronic devices.

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Nitrogen (N₂, high-purity) - CAS 7727-37-9 - Chemical Product

CAS: 7727-37-9 N₂

Nitrogen (N₂, high-purity)

Electronic & Semiconductor Chemicals Process Gases

Nitrogen (N₂, high-purity) for electronic and semiconductor applications.

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Argon (Ar, high-purity) - CAS 7440-37-1 - Chemical Product

CAS: 7440-37-1 Ar

Argon (Ar, high-purity)

Electronic & Semiconductor Chemicals Process Gases

Argon (Ar, high-purity) for sputtering and semiconductor processes.

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Oxygen (O₂, high-purity) - CAS 7782-44-7 - Chemical Product

CAS: 7782-44-7 O₂

Oxygen (O₂, high-purity)

Electronic & Semiconductor Chemicals Process Gases

Oxygen (O₂, high-purity) for electronic and semiconductor applications.

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Hydrogen (H₂, high-purity) - CAS 1333-74-0 - Chemical Product

CAS: 1333-74-0 H₂

Hydrogen (H₂, high-purity)

Electronic & Semiconductor Chemicals Process Gases

Hydrogen (H₂, high-purity) for semiconductor processing and annealing.

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Helium (He, high-purity) - CAS 7440-59-7 - Chemical Product

CAS: 7440-59-7 He

Helium (He, high-purity)

Electronic & Semiconductor Chemicals Process Gases

Helium (He, high-purity) for leak testing in electronics.

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Chlorine (Cl₂, high-purity) - CAS 7782-50-5 - Chemical Product

CAS: 7782-50-5 Cl₂

Chlorine (Cl₂, high-purity)

Electronic & Semiconductor Chemicals Etch Gases

Chlorine (Cl₂, high-purity) for silicon etching in electronics.

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Boron Trichloride (BCl₃) - CAS 10294-34-5 - Chemical Product

CAS: 10294-34-5 BCl₃

Boron Trichloride (BCl₃)

Electronic & Semiconductor Chemicals Etch Gases

Boron Trichloride (BCl₃) for high-precision metal etching in electronics.

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Phosphine (PH₃) - CAS 7803-51-2 - Chemical Product

CAS: 7803-51-2 PH₃

Phosphine (PH₃)

Electronic & Semiconductor Chemicals Doping Gases

Phosphine (PH₃) for n-type doping in semiconductor manufacturing.

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