Filtered Products
Showing 50 of 156 products • Sorted by Name
Electronic-Grade Sulfuric Acid (98%, G5)
Electronic-Grade Nitric Acid (68%, G4/G5)
Electronic-Grade Hydrochloric Acid (31%)
Electronic-Grade Phosphoric Acid (85%)
Electronic-Grade Hydrofluoric Acid (HF, 49%)
Electronic-Grade Acetic Acid (99.9%+)
Electronic-Grade Isopropyl Alcohol (IPA, 99.99%)
Electronic-Grade Acetone (99.99%+)
Electronic-Grade N-Methyl-2-pyrrolidone (NMP)
Electronic-Grade Methanol
Electronic-Grade Ethanol
Ultra-Pure Water (UPW)
G-Line Photoresist (365 nm)
I-Line Photoresist (365 nm)
KrF Photoresist (248 nm)
ArF Photoresist (193 nm, dry)
ArF Immersion Photoresist (193 nm)
EUV Photoresist (13.5 nm)
Positive Tone Photoresist
Negative Tone Photoresist
Bottom Anti-Reflective Coating (BARC)
Top Coat (Immersion Lithography)
Photoacid Generator (PAG)
TMAH-Based Developer (2.38%)
Buffered Oxide Etch (BOE, HF/NH₄F)
SC1 Clean (NH₄OH + H₂O₂ + H₂O)
SC2 Clean (HCl + H₂O₂ + H₂O)
RCA Standard Clean
Copper Barrier Cleaners
Post-CMP Cleaning Fluids
Single-Wafer Spray Cleaners
Dry Etch Gases (CF₄, C₄F₈, SF₆, NF₃)
Deposition Gases (SiH₄, TEOS, WF₆)
Tungsten Hexafluoride (WF₆)
Silane (SiH₄)
TEOS (Tetraethyl Orthosilicate)
Titanium Tetrachloride (TiCl₄)
Tantalum Pentachloride (TaCl₅)
Ammonium Hydroxide (28–30%, Electronic Grade)
Hydrogen Peroxide (30%, Electronic Grade)
Silicon Wafers (polished)
Gallium Arsenide (GaAs) Substrates
Nitrogen (N₂, high-purity)
Argon (Ar, high-purity)
Oxygen (O₂, high-purity)
Hydrogen (H₂, high-purity)
Helium (He, high-purity)
Chlorine (Cl₂, high-purity)
Boron Trichloride (BCl₃)
Phosphine (PH₃)
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