Post-CMP Cleaning Fluids
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Overview
Post-CMP Cleaning Fluids for semiconductor planarization processes.
CAS Number
N/A
Molecular Formula
N/A
Product Grade
SEMI
Appearance
liquid
Delivery Forms
Drum IBC Bulk
Product Description
Post-CMP Cleaning Fluids are specialized solutions designed to remove residual particles and contaminants after the chemical mechanical planarization (CMP) process. These fluids play a critical role in ensuring the cleanliness and integrity of semiconductor wafers, supporting high-performance electronic devices. Key applications include post-CMP cleaning in the electronics and semiconductor industry, where their surfactant, wetting, and dispersing properties, along with corrosion inhibition, are highly valued.
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