Photoacid Generator (PAG)

Photoacid Generator (PAG) is a critical component in photoresist formulations used in the semiconductor industry. It plays an essential role during the photolithography process by generating acid upon exposure to light, which catalyzes the chemical reactions necessary for pattern formation on silicon wafers. Key applications include the manufacturing of integrated circuits and microelectronic devices, where high resolution and precise control over the patterning process are required.