TEOS (Tetraethyl Orthosilicate)

TEOS (Tetraethyl Orthosilicate) is a key precursor used in the chemical vapor deposition (CVD) process to form silicon dioxide layers. It is widely utilized in the electronics and semiconductor industry for creating dielectric films with excellent insulating properties. TEOS contributes to the production of high-performance microelectronic devices, ensuring reliability and efficiency in various applications.